Thermal Annealing of Ag Implanted Silicon: Relationship between Structural and Optical Properties

Authors

  • Almedina Modrić-Šahbazović University of Tuzla, Faculty of Natural Sciences and Mathematics
  • M. Novaković Vinča Institute of Nuclear Sciences, University of Belgrade
  • E. Schmidt Institute of Solid State Physics, Friedrich Schiller University Jena
  • N. Bibić Vinča Institute of Nuclear Sciences, University of Belgrade
  • I. Gazdić University of Tuzla, Faculty of Natural Sciences and Mathematics
  • C. Ronning Institute of Solid State Physics, Friedrich Schiller University Jena
  • Z. Rakočević Vinča Institute of Nuclear Sciences, University of Belgrade

Abstract

Low energy Ag ions were implanted into silicon and annealed at different temperatures in order to generate plasmonic active silicon hybrids. It was found that as the ion fluence of irradiation was increased, a monotonic decrease in the absorption spectra in the ultraviolet region occurs, due to amorphization and macro structuring of the Si surface. At the same time, the optical spectra are characterized by a strong band after implantation presenting the contribution of the surface plasmon resonance (SPR) of Ag nanoparticles. After heat treatment at 500 and 600 ºC, the SPR peak shifts to lower wavelengths, as compared to as implanted samples, whereas the plasmon position shifts to higher wavelengths for annealing at 700 °C. This observation can be explained by either an out-diffusion of Ag or by stress relaxation and recrystallization of silicon.

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Published

2020-05-05

Issue

Vol. 52 No. 2 (2020)

Section

Articles